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Description:
LAM 580 Oxide Etchers
(580)
LAM 580 Oxide Etcher
Fully automated microprocessor control.
High-throughput vacuum loadlocked.
Programmable, variable electrode spacing.
End point detection.
Cassette to cassette.
Can accomodate 3" to 6" wafers.
Five gas channel maximum.
RF power 1250 watts @ 13.56 MHz. 208 VAC, 3 Phase, 60 Hz.
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