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Description:
Ultratech 2066 Mask Cleaner
(2066)
Uses non abrasive high pressure jets to effectively clean particulates from photomasks & wafers. Water pressure adjustable up to 2,500 psi with oiless high pressure pump. Spindle speeds up to 3,000 rpm. Provides 2 micron filtration. 115 V, 60 Hz, 5A.
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