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Description:
AG Associates RTP Systems 4100
(RTP Systems 4100)
Heatpulse 4100 Rapid Thermal Process System. Single wafer processing. Precise temperature/time control. Multiple cycle processing, full SECS II capability. Steady state temp. Range: 400°C - 1300°C. Steady state process time: Programmable: 0-600 sec. Ramp-up Rate: Programmable, 10°C/sec. - 250°C. Wafer size: 4”, 5”, and 6” standard.
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