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Description:
Karl Suss MA 6 Aligner
(MA 6)
Large Gap Mask Aligner System is in the MA6 configuration with top side alignment Designed to align wafer to mask with separations of up to 300 nm using the included Grab Image option Has proximity, contact and hard contact modes Mask holders included are 5 x 5 and 6 x 6 Manual load and align will handle 3 to 6 wafers Uses wedge effect calibration on chuck for all modes of exposure Has single or multiple exposure modes 500 Watt Hg Lamp powered by Karl Suss CIC500 supply.
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