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Description:
Ultratech / Semiconductor Systems 608 Mask Cleaner
(Ultratech 608 Mask Cleaner)
Ultratech / Semicondustor Systems 608 substrate cleaner.
* Oversized access lid to accomodate 300mm Wafers and 10" Square Masks * Currently configured for High Pressure cleaning.
* Tool has 3 available chemical inputs.
* Drying method = Spin + N2.
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