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Description:
Nanometrics Nanospec AFT 210
(Nanometrics Nanospec AFT 210)
Nanometrics AFT 210
* Film Measurement System,
* Range of Thicknesses: 100 to 500,000 angstroms,
* Spot Size: 50 um with 5x objective, 25 um with 10x
objective, 6.5 um with 40x objective
* Film Types: Oxide on Silicon; Nitride on Silicon; Negative
Resist on Silicon; Polysilicon on Oxide; Negative Resist on
Oxide; Nitride on Oxide; Polyimide on Silicon; Positive Resist
on Silicon; Positive Resist on Oxide
* Reflectance Mode
* Thick Films, Reproducibility: 5A ± 5% depending upon the
film type
* Typical Measurement Time: 2.5 seconds.
See below under "More Details" for a standard specification sheet.
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