|
Description:
Kulicke & Soffa 973 Substrate cleaning system
(K & S 973 MicroWash)
Kulicke & Soffa 973 MicroWash
* Handles up to 8" wafers and 10" diagonal substrates
* For sawed/scribed wafers, photomask and other substrate
cleaning
* Touch screen operations and recipe storage
* Oscillation High pressure DI spray arm - up to 2000 psi
* Filtration at 0.2um
* Combined chamber exhaust and drain
* Built in safety interlocks
* CO2 re-ionizer for elimination of static charge.
* Nitrogen dry. Infrared heat lamp.
* 115V, 50/60 Hz, 6A.
* Compatible with most water soluble photoresist strippers
* The K & S 973 is now owned by ADT
* See attached sales brochure
* 8ea. avaialable
|
