Description: MRC 903A Sputtering System
(903A)
Loadlocked 3 Target DC Sputtering System with RF Etch. PC Controller upgrade. Upgraded power supplies and vacuum gauges. CTI onboard cryopump with roughing pump. 3 DC cathodes 4¿¿ x 14 7/8.¿ Advanced Energy RFX-600 13.56 MHz 600W RF Generator with a TCM matching network for sputter etch. Advanced Energy MDX-10K DC Magnetron sputtering power supply.
|